Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon-Containing Films
| Author | : DW. Hess |
| Publisher | : |
| Total Pages | : 8 |
| Release | : 1983 |
| ISBN-10 | : OCLC:1251667875 |
| ISBN-13 | : |
| Rating | : 4/5 (75 Downloads) |
Book Synopsis Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon-Containing Films by : DW. Hess
Download or read book Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon-Containing Films written by DW. Hess and published by . This book was released on 1983 with total page 8 pages. Available in PDF, EPUB and Kindle. Book excerpt: The use of a radio frequency (rf) glow discharge or plasma has recently come into favor for the deposition of thin films. In plasma-enhanced chemical vapor deposition (PECVD), chemical reactions can be carried out at low (