Development and Application of In-Situ, Real Time and Ex-Situ Characterization Techniques to Study the Growth of High Temperature Superconducting (HTSC) Films and Interfaces

Development and Application of In-Situ, Real Time and Ex-Situ Characterization Techniques to Study the Growth of High Temperature Superconducting (HTSC) Films and Interfaces
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ISBN-10 : OCLC:946109367
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Book Synopsis Development and Application of In-Situ, Real Time and Ex-Situ Characterization Techniques to Study the Growth of High Temperature Superconducting (HTSC) Films and Interfaces by :

Download or read book Development and Application of In-Situ, Real Time and Ex-Situ Characterization Techniques to Study the Growth of High Temperature Superconducting (HTSC) Films and Interfaces written by and published by . This book was released on 1997 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The objectives of this program are: (1) To demonstrate Time of Flight Ion Scattering and Recoil (ToF-ISARS) Spectroscopy and Spectroscopic Ellipsometry (SE) for in-situ and real time characterization of HTSC thin films and processes. (2) To study HTSC thin film processes and interface reactions.


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