Surface characteristics of etched and non-etched silicon germanium (SiGe)/Si graded structure with varying Ge concentration grown by ultra-high vacuum (UHV)/chemical vapor deposition (CVD) for optoelectronic and power conversion applications
| Author | : Fred Semendy |
| Publisher | : |
| Total Pages | : 16 |
| Release | : 2012 |
| ISBN-10 | : OCLC:824557063 |
| ISBN-13 | : |
| Rating | : 4/5 (63 Downloads) |
Book Synopsis Surface characteristics of etched and non-etched silicon germanium (SiGe)/Si graded structure with varying Ge concentration grown by ultra-high vacuum (UHV)/chemical vapor deposition (CVD) for optoelectronic and power conversion applications by : Fred Semendy
Download or read book Surface characteristics of etched and non-etched silicon germanium (SiGe)/Si graded structure with varying Ge concentration grown by ultra-high vacuum (UHV)/chemical vapor deposition (CVD) for optoelectronic and power conversion applications written by Fred Semendy and published by . This book was released on 2012 with total page 16 pages. Available in PDF, EPUB and Kindle. Book excerpt: